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PAE Polymers


Xerox Poly(Arylene Ether) and Poly (Arylene Ether Ketone) polymers are new advanced materials invented by Xerox researchers and developed and scaled-up at Xerox Research Centre of Canada. This exciting new technology, which has many potential applications, is now available for licensing by chemical and polymer manufacturers.

Technology Description

Poly(arylene ether)s (PAE) photoresist materials are based upon high performance polymers with photo- and thermo-sensitive groups that enable them to be patterned into highly defined three-dimensional surface structures. These photoresists are resistant to harsh chemical and thermal environments. They have unique mechanical and physical properties relative to other currently available photoresist materials.

PAE Polymer Structure

Xerox has developed not only the synthetic chemical processes to make PAE photoresist but also the necessary methods to formulate and form Micro Electro Mechanical System (MEMS) devices with it. While this material was developed for use in proprietary inkjet print heads its potential applications are much broader. In fact Xerox can customize PAE polymers for mechanical properties, solvent resistance or surface properties relative to specific application contexts.

PAE Comparision of Polymer Profiles

Ink jet nozzles structures made with competing polymers - Maximum aspect ratio for the polyimide is 2:1 and the maximum aspect ratio for the PAE is 3:1. Z direction shrinkage for the polyimide is 55% and z direction shrinkage for the PAE is 12%. Note that PAE is able to produce finer (smaller diameter) nozzles with significantly less shrinkage.

Benefits

  • Adhesion
  • Chemical stability/resistance
  • Hydrolytic stability
  • Low shrinkage during curing
  • Solvent resistance
  • Thermal stability

Intellectual Property Summary

For your convenience and review, we have provided a sample of selected patents from our portfolio.

U.S. 6187512 Process for halomethylation of high performance polymers
U.S. 6184263 Blends containing photosensitive high performance aromatic ether curable polymers
U.S. 6174636 Imaging members containing arylene ether alcohol polymers
U.S. 6139920 Photoresist compositions
U.S. 6124372 High performance polymer compositions having photosensitivity-imparting substituents and thermal sensitivity-imparting substituents
U.S. 6117967 Arylene ether alcohol polymers
U.S. 6090453 Halomethylated high performance curable polymers
U.S. 6087414 Process for direct substitution of high performance polymers with unsaturated ester groups
U.S. 6020119 Process for halomethylation of high performance polymers
U.S. 6007877 Aqueous developable high performance photosensitive curable aromatic ether polymers
U.S. 5994425 Curable compositions containing photosensitive high performance aromatic ether polymers
U.S. 5958995 Blends containing photosensitive high performance aromatic ether curable polymers
U.S. 5945253 High performance curable polymers and processes for the preparation thereof
U.S. 5907001 Process for the preparation of photopatternable polymers
U.S. 5889077 Process for direct substitution of high performance polymers with unsaturated ester groups
U.S. 5882814 Imaging members containing high performance charge transporting polymers
U.S. 5874192 Imaging members with charge transport layers containing high performance polymer blends
U.S. 5863963 Halomethylated high performance curable polymers
U.S. 5849809 Hydroxyalkylated high performance curable polymers
U.S. 5814426 Imaging members containing high performance polymers
U.S. 5761809 Process for substituting haloalkylated polymers with unsaturated ester, ether, and alkylcarboxymethylene groups
U.S. 5753783 Process for haloalkylation of high performance polymers
U.S. 5739254 Process for haloalkylation of high performance polymers
U.S. 5731078 Developing apparatus and coated developer roller

For Licensing Information

To learn more about licensing the PAE Polymers technology.
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